AJA Sputter Deposition Services — ATC-1800-HV

AJA offers sputter deposition services using the ATC-1800-HV sputter-up system, suitable for research samples, coating development, materials testing, and small-batch thin film fabrication. This service is intended for customers who need access to advanced sputtering capabilities without purchasing or operating their own deposition system.

The system supports samples up to 4 inches in diameter and is equipped with four sputter guns, allowing sequential deposition or co-deposition from multiple sources. Available deposition options include DC, RF, pulsed DC, and HiPIMS power sources, as well as reactive sputtering using Ar, O₂, and N₂ process gases.

Additional capabilities include QCM deposition rate calibration, substrate heating up to 1000°C, RF bias, reactive gas ring configuration, k-Space ICE thin film monitoring, and a load-lock for faster sample turnaround. The system also includes a large wafer direct deposition add-on chamber with capability for wafers up to 6 inches.

In-situ thin film monitoring using k-Space ICE is available for selected deposition processes, supporting real-time monitoring of film growth, thickness, growth rate, optical properties, stress, and substrate curvature.