Equipment:
- Ultra high vacuum (UHV) system with pressure in analytical chamber ≈10-9
Torr; - Al K-alpha X-ray
source (energy 1486.6 eV) PHI model 04-548 with PHI model 10-410 monochromator; -
Sputter Ion Gun PHI model 04-303 for etching samples with ion energy up
to 5 keV
Research possibilities:
- Quantitative elemental analysis of the surface, from Li to U, with a sensitivity up to 0.1 at.%
- Analysis of chemical bonds on the surface, which, in particular, allows to determine the quantitative phase and chemical composition
- Surface analysis for depths up to 10 nm and area 0.5-1 mm x 3.5 mm
- Cleaning/Etching the sample surface with Ar+ ion beam. Depth profiling
- Measurement of samples with a form factor of up to 100/203 mm in diameter and up to 15/25 mm in thickness








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