AJA offers field emission scanning electron microscopy imaging services to support thin film analysis, coating evaluation, device inspection, nanoparticle observation, and applications development.
The SEM is equipped with a Schottky field emission source and supports multiple imaging modes, including in-lens secondary electron imaging, SE-II imaging, and backscattered electron imaging. It operates over a wide voltage range from 0.2 to 30 kV and provides magnification up to 900,000×.
The system also includes a six-axis stage and a 200 mm wafer load-lock with 6-inch stage travel, making it suitable for imaging research samples, thin film surfaces, microdevices, and wafer-based specimens.
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