The Rigaku SmartLab Ultra-High-Resolution Triple-Axis X-ray Thin Film Diffraction System is an advanced X-ray diffraction platform designed for the structural characterization of thin films, coatings, powders, multilayers, and crystalline materials.
The system provides flexible thin-film analysis by allowing users to select suitable measurement conditions, experimental geometries, and application methods according to the specific sample and research objective. This makes it suitable for both routine and advanced X-ray characterization tasks.
The instrument is a multimodular system with quick alignment, computer-aided operation, reduced measurement time, modern X-ray source technology, high-speed real-time detectors, and diffraction data processing capabilities.
The system supports multiple measurement techniques, including:
- X-ray Powder Diffraction — XRPD
- High-Resolution X-ray Diffraction — HRXRD, including multiple-reflection HR-MRXRD configuration with Ge(220) 2-bounce and 4-bounce monochromators, Ge(220) 2-bounce analyzer, and focusing/flat diffracted-beam monochromator
- X-ray Reflectometry — XRR, including high-resolution multiple-reflection XRR
- Grazing-Incidence X-ray Diffraction — GIXRD
- In-Plane Grazing-Incidence Diffraction — IPGID
- Small-Angle X-ray Scattering — SAXS
- Single-Crystal Diffraction — SCD
This equipment can be used for the analysis of crystal structure, phase composition, thin-film quality, layer thickness, surface/interface properties, crystallographic orientation, strain, texture, and nanoscale structural features, depending on the selected measurement configuration and sample type.
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